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Maskless Lithography – NRE-free Alternative for Deep-submicron ASICs
2 r8 }( c/ z4 B; a eASIC’s innovative use of LUT-based logic programming combined with single via layer customizable routing makes its technology an ideal candidate for maskless lithography using Direct-Write eBeam customization. Because all of the interconnect customization is performed on a single via layer (Via 6), routing customization can be performed efficiently by eBeam, eliminating the need for costly lithography masks.
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1 z6 B9 v4 P* w& B0 t e% i Using eBeam with eASIC technology: Customer Advantages % x7 S1 g' ~. H2 v3 f/ Z' v
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Eliminate mask costs – NO NRE
, \( N" R E6 [: o# YAllow multiple projects on the same wafer 8 Y3 v2 H6 w# M- s% T
o No minimum-volume required
P& q, s. _: h1 DEliminate days of mask creation time * y/ q1 I) ? W# z+ d/ c7 S
Cut time and cost – Via–only customization proceeds at 10x the speed
" z1 q# x7 N+ A2 T' H, @0 s* ZRely on proven maskless technology
2 T/ n' |4 b1 o7 d4 Z$ Z9 F; i, C o Available from multiple vendors: ST, Toshiba, UMC, and more |
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