NLDD與NDD

hyseresis

想請問一下各位:
# f% \7 Y* p2 U$ k- f/ V, `4 XNLDD與NDD這兩層layer是做什摩用的??
在layout上要注意什麼?
如能解答,必定感謝

tcsungeric

NLDD is a N-type lightly doped drain (implant layer) for E-field reduction @drain or source site especially for general submicro process.
5 Q) [# u% I! S6 a7 DNDD is a N-type double diffusion drain (implant layer for current technology) for E-field reduction @drain or source site (depend on asymmetric or symmetric device structure) especially for high voltage process. No special layout concern, just follow DRM.