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Maskless Lithography – NRE-free Alternative for Deep-submicron ASICs 6 @: D3 E; P8 u: N# M
eASIC’s innovative use of LUT-based logic programming combined with single via layer customizable routing makes its technology an ideal candidate for maskless lithography using Direct-Write eBeam customization. Because all of the interconnect customization is performed on a single via layer (Via 6), routing customization can be performed efficiently by eBeam, eliminating the need for costly lithography masks.: Z! W' B& @" l. C6 b1 R; Q/ P
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Using eBeam with eASIC technology: Customer Advantages 5 Y* m2 ?5 O" U5 {
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Eliminate mask costs – NO NRE
( U6 j* O8 H& J A; E( hAllow multiple projects on the same wafer ( y ]8 Q7 n% u$ H* [
o No minimum-volume required 1 W5 b- L; N, C2 d
Eliminate days of mask creation time * Z( y; G, V) t: L" W7 F1 Y
Cut time and cost – Via–only customization proceeds at 10x the speed
: Y. F0 D r3 aRely on proven maskless technology
& X5 i O/ ]- u) o1 M o Available from multiple vendors: ST, Toshiba, UMC, and more |
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