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Maskless Lithography – NRE-free Alternative for Deep-submicron ASICs 7 J) q" y. G6 S$ R9 Y: ], y8 p) j" L
eASIC’s innovative use of LUT-based logic programming combined with single via layer customizable routing makes its technology an ideal candidate for maskless lithography using Direct-Write eBeam customization. Because all of the interconnect customization is performed on a single via layer (Via 6), routing customization can be performed efficiently by eBeam, eliminating the need for costly lithography masks.
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2 q2 m( t0 E; E* m, F( X Using eBeam with eASIC technology: Customer Advantages
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( \( B# F" H) y8 }6 m' f& DEliminate mask costs – NO NRE
/ ^8 F; W2 O2 q% |/ _Allow multiple projects on the same wafer 9 b; @+ a/ _5 A0 v
o No minimum-volume required
5 ]( V% V4 ]4 {- [+ rEliminate days of mask creation time , h; o! R' _; J A
Cut time and cost – Via–only customization proceeds at 10x the speed
# [! {. L, o; ?Rely on proven maskless technology
4 Z) O+ L) h( C, n! `" J: J# S. | o Available from multiple vendors: ST, Toshiba, UMC, and more |
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