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我在之前的公司有lay過double guard rings,內圍是用PTHIN guard rings,外圍是用7 M8 H, I$ n* q8 }- l. k
Nwell+NTHIN(甜甜圈結構).主要就是用來防止noise,那時是圍在Oscillator外圍.
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Dummy的話,不知道你指的是那部份?? 引述一篇paper " SmartExtract:Accurate Capacitance 2 X5 u! H* g/ [
Extraction for SOC", 這裡提到的dummy是指layout完成後,在每層layer空曠處,補上同一layer ( G/ C9 \* u+ q) [9 O. P5 x
dummy, 為的是在CMP process時,有較佳的均勻性:! j% D k6 [# r
Dummy(or fill) metal is introduced in the interconnect process flow to enable uniform" `8 `, _" z% [8 }) @
thickness control in the CMP process. Dummy metal needs to be treated as floating metal / [2 q- \! n7 b9 j* w
unless it is intentionally connected to a constant potential. Floating dummy metal
( |, b( N. E+ K9 tessentially acts as a capacitance divider.1 F& N o& l! G* N8 v {: w/ U* k
另外有一種dummy, 之前我在做analog layout時,會在需做match的mos旁,故意lay半顆或整顆
0 m! C6 F1 I3 q9 `- m5 lmos,除了你寫的那些原因,我想是因為實體mos的邊緣不見得是像layout般的四方形(what you draw is not what you get),可能是梯形或不規則多邊形,製程上很難做到如此完美,所以為了確保3 k r* H/ p# t. {* T) y
主要的mos的完整性及對稱性,在mos旁再多加dummy mos(不要讓主要mos成為最邊緣的部& r+ p9 \+ m) l0 f; y
份).以上是我自己的想法,歡迎各位先進指教 |
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