NLDD與NDD

hyseresis

想請問一下各位:
( P8 F, H# K& r+ F0 |NLDD與NDD這兩層layer是做什摩用的??
6 [  @- y5 e# `' U在layout上要注意什麼?
如能解答,必定感謝

tcsungeric

NLDD is a N-type lightly doped drain (implant layer) for E-field reduction @drain or source site especially for general submicro process.
' J* R& c6 ?4 m/ uNDD is a N-type double diffusion drain (implant layer for current technology) for E-field reduction @drain or source site (depend on asymmetric or symmetric device structure) especially for high voltage process. No special layout concern, just follow DRM.