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Maskless Lithography – NRE-free Alternative for Deep-submicron ASICs : E- X9 Q. c, v- D7 A- @
eASIC’s innovative use of LUT-based logic programming combined with single via layer customizable routing makes its technology an ideal candidate for maskless lithography using Direct-Write eBeam customization. Because all of the interconnect customization is performed on a single via layer (Via 6), routing customization can be performed efficiently by eBeam, eliminating the need for costly lithography masks.0 T% W# Y. Z0 W! @; A7 \# R. {
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Using eBeam with eASIC technology: Customer Advantages
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Eliminate mask costs – NO NRE
. O& D5 C3 y9 LAllow multiple projects on the same wafer 8 j& }, _& f+ _ W- O
o No minimum-volume required
" \# s+ ?- K2 x3 l7 nEliminate days of mask creation time
1 N! L t4 Y- \4 P9 @Cut time and cost – Via–only customization proceeds at 10x the speed 3 A- l; C: k. V( d! ^5 H y% @
Rely on proven maskless technology
6 ]: ]2 P5 Y9 E! m o Available from multiple vendors: ST, Toshiba, UMC, and more |
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