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Design for Manufacturability and Yield for Nano-Scale CMOS (Series on Integrated Circuits and Systems) (Hardcover)by Charles Chiang (Author), Jamil Kawa (Author) . D0 A w, U+ ~! v5 K$ ^( X. s# E# W
Key Phrases: open critical area, final thickness range, defect size distribution function, Model Based Dummy Filling, Improving Critical Area, Practical Application (more...)
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: c, t8 S" ^6 Q; ? (1 customer review)
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