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標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管? [打印本頁]

作者: scy8080    時間: 2012-2-3 02:59 PM
標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
作者: hoodlum    時間: 2012-2-3 10:59 PM
小弟的看法是4 \  B7 X# |1 [* F* o0 ^0 p7 S
會不會是標準CMOS的製程裡
4 h5 s/ ?1 p% l9 `  @! ^' x無法做出二極體, 只能用寄生的$ V* R  P: {1 a, {* l( L% l0 W
vertical PNP呢???
作者: leo911759    時間: 2012-2-8 04:02 PM
其實也是有的。7 j' G) Y% _$ |  Z7 u( _

! ~6 E; O4 N9 ^& [/ ?1 K有一些Paper就是用Diode,或是NPN。
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而會用PNP 是因為早期CMOS製程中,只能寄生等效PNP電路。' u% z) Y+ R! |' O# P. ^
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其中的寄生等效Diode會有Latch-up的問題。. T2 R5 X& l$ R: N4 c0 v
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這是製程受限的關係,比較先進的製程就沒這種問題了。
作者: patrick02046    時間: 2012-2-9 01:24 PM
在EDA Board 抓的資訊, 參考一下:3 z9 V% ]2 s/ P. v$ a

. T- R! h/ W# [- b2 b% F& aI believe that what you are getting at is that there is a specific structure of P+/Nwell/Psub that is used for
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) x) k8 V# z0 r$ ^the "bipolar", so you are asking why use that structure rather than simply a P+/Nwell "diode". Here is my take
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on this:3 n& ^: V4 a! o5 j1 t& n

0 v# A; x2 C- A; m1- The "bipolar" will simulate more accurately than the "diode", since it will include the substrate current - Q' E7 U/ l6 k* j5 U" f: M- Z  g

4 ^9 A: d% e# xthat is probably not modeled for the "diode".! C. w+ O' F; f6 X% F+ @
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2- There usually is a specific structure for the "bipolar" that has characterization data available. When . v; J1 w9 q, a4 \* z: z8 J
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building a bandgap structure, the good characterization is needed in order to properly determine the tempco of 9 G. {- y( k( {1 x3 [
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the Base-emitter voltage., I- a9 v0 Z8 V  U8 ]

3 X# c; O# D. u8 e$ A  e8 V9 G3 n7 A3- The additional structure of the bipolar should help prevent current injection into other substrate tied
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: [6 l! |% K  Z; h8 i: }devices.
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There is, of course, nothing preventing the use of a P+/Nwell diode in your application.
作者: luckyhuihui666    時間: 2012-4-13 08:06 PM
主要原因就是二极管不准确……




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