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; Y E1 e3 @, TDesign for Manufacturability and Yield for Nano-Scale CMOS (Series on Integrated Circuits and Systems) (Hardcover)by Charles Chiang (Author), Jamil Kawa (Author) # c2 v+ |- ~2 w b
Key Phrases: open critical area, final thickness range, defect size distribution function, Model Based Dummy Filling, Improving Critical Area, Practical Application (more...) 3 p. r7 t, w0 l/ @. `" K) M' \
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