標題: HF-vapor release process for ultrathin single crystal silicon cantilevers[EPFL] [打印本頁] 作者: mt7344 時間: 2007-6-7 09:54 PM 標題: HF-vapor release process for ultrathin single crystal silicon cantilevers[EPFL] Combined Al-protection and HF-vapor release process for ultrathin single crystal silicon cantilevers ( v) g0 ?0 e& M P( d/ FAbstract " Y+ A# o. r- r( ?8 sA new technology based on a combination of Al-protection layers and HF-vapor etching to produce ultrathin single crystal silicon8 p1 E, z! Z4 K+ S
cantilevers is presented. 500 lm long, 10 lm wide and 0.5 lm thick cantilevers have been fabricated with a high yield. A resonance frequency# U: t1 k+ H+ }4 D
of 2 kHz, Q factor >100,000 and a force sensitivity of 6.0 · 1017 N/Hz1/2 have been obtained in vacuum at room temperature for( r! \4 D# W9 Q0 |8 i# Q
cantilevers annealed at 800 C.0 T: w% ~& D# t5 ?! C
s0 @. ?( R) D ( K' l# H/ u: L: v1 c- h7 J網路上抓的 paper, 希望對大家有幫助!! ( o, C' C' k0 o( P8 m7 f權限10 & RDB=0" E! m$ E0 w7 n X) ?- [
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[ 本帖最後由 mt7344 於 2007-6-7 09:57 PM 編輯 ]