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標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管? [打印本頁]

作者: scy8080    時間: 2012-2-3 02:59 PM
標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
作者: hoodlum    時間: 2012-2-3 10:59 PM
小弟的看法是
# T5 R7 K5 U4 g會不會是標準CMOS的製程裡
1 U# Y8 j" ^- O7 s7 d& S無法做出二極體, 只能用寄生的7 K9 ^5 Y5 B1 i/ |7 ^5 O1 g! k
vertical PNP呢???
作者: leo911759    時間: 2012-2-8 04:02 PM
其實也是有的。+ m) e9 \4 z  V: {5 U
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有一些Paper就是用Diode,或是NPN。$ k% K: H; j  V8 M8 T
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而會用PNP 是因為早期CMOS製程中,只能寄生等效PNP電路。7 j2 q" k! A8 ?- |( a: _
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其中的寄生等效Diode會有Latch-up的問題。  l; E& `' P* x! w3 C# C

9 z, t- G. B; y: R: [- I/ C) A這是製程受限的關係,比較先進的製程就沒這種問題了。
作者: patrick02046    時間: 2012-2-9 01:24 PM
在EDA Board 抓的資訊, 參考一下:
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: p: f* m4 `: a) nI believe that what you are getting at is that there is a specific structure of P+/Nwell/Psub that is used for " N. C8 K- {3 R
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the "bipolar", so you are asking why use that structure rather than simply a P+/Nwell "diode". Here is my take
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  [! _) v  f* J' s1 v; Gon this:
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5 `; L2 z& [2 y6 w1- The "bipolar" will simulate more accurately than the "diode", since it will include the substrate current 5 F- v4 T! X3 g: \8 m; ^
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that is probably not modeled for the "diode".
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2- There usually is a specific structure for the "bipolar" that has characterization data available. When ! Y  c5 t9 L4 N( ?

# S+ `; ]2 x5 Obuilding a bandgap structure, the good characterization is needed in order to properly determine the tempco of
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the Base-emitter voltage.
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3- The additional structure of the bipolar should help prevent current injection into other substrate tied
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9 T9 ?- q' G9 f* AThere is, of course, nothing preventing the use of a P+/Nwell diode in your application.
作者: luckyhuihui666    時間: 2012-4-13 08:06 PM
主要原因就是二极管不准确……




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