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標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管? [打印本頁]

作者: scy8080    時間: 2012-2-3 02:59 PM
標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
作者: hoodlum    時間: 2012-2-3 10:59 PM
小弟的看法是
( y$ ~4 U# z' K/ `$ B會不會是標準CMOS的製程裡
  g$ r; o: O" L. {' Z* u; C( S無法做出二極體, 只能用寄生的6 K1 y5 C+ K, |4 n
vertical PNP呢???
作者: leo911759    時間: 2012-2-8 04:02 PM
其實也是有的。
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有一些Paper就是用Diode,或是NPN。
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而會用PNP 是因為早期CMOS製程中,只能寄生等效PNP電路。* \# r4 [: B6 [" d

% P. Q) B6 ^) e! m/ E- o其中的寄生等效Diode會有Latch-up的問題。
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這是製程受限的關係,比較先進的製程就沒這種問題了。
作者: patrick02046    時間: 2012-2-9 01:24 PM
在EDA Board 抓的資訊, 參考一下:1 y% I- N6 f& j5 e
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I believe that what you are getting at is that there is a specific structure of P+/Nwell/Psub that is used for ( M8 \5 q$ \  r
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the "bipolar", so you are asking why use that structure rather than simply a P+/Nwell "diode". Here is my take
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' `/ a0 t2 l9 q# o; |: I! gon this:
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1- The "bipolar" will simulate more accurately than the "diode", since it will include the substrate current % ?: D2 n( Z6 d- f- @8 O
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that is probably not modeled for the "diode".
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! V: d; r) E5 p" h8 f8 n) V2- There usually is a specific structure for the "bipolar" that has characterization data available. When
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9 y6 s4 C. z5 z- _$ ?building a bandgap structure, the good characterization is needed in order to properly determine the tempco of 4 x4 G4 s9 ]5 [
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the Base-emitter voltage.
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3- The additional structure of the bipolar should help prevent current injection into other substrate tied
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devices.
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There is, of course, nothing preventing the use of a P+/Nwell diode in your application.
作者: luckyhuihui666    時間: 2012-4-13 08:06 PM
主要原因就是二极管不准确……




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